Thin Film Laboratory

Research studies in the field of experimental solid-state physics encompass various techniques for semiconductor thin film preparation, including thermal evaporation, e-beam deposition, and magnetron sputtering. These studies focus on the electrical, optical, and structural characterization of thin films, specifically targeting elements from the II-VI and III-VI groups such as CdS, GaSe, InSe, AgInSe2, and CuIn(1-x)GaxSe2.

Additionally, the group investigates the fabrication and optimization of thin film diodes and heterojunction devices using various noble metals and alloys. They also design and construct the necessary setups for thin film production and measurement. Characterization techniques include X-ray diffraction, XPS (X-ray photoemission spectroscopy), SEM (scanning electron microscopy), AFM (atomic force microscopy), thermal conductivity, photo-conductivity, photoresponse, optical transmission and reflectance, current-voltage, and capacitance-voltage measurements.

Furthermore, the group conducts studies on ceramic temperature sensors and thermal resistors, producing them in pellet or thin film forms with a negative temperature coefficient (NTC). These materials are composed of transition metal oxides (such as Co, Mn, Ni, Cu, etc.) with cubic spinel metallic structures.